溶胶-凝胶法制备高折射率TiO2薄膜
盛永刚[1,3] 徐耀[1] 张磊[1,2,3] 梁丽萍[1,3] 吴东[1] 孙予罕[1] 蒋晓东[2] 魏晓峰[2]
[1]中国科学院山西煤炭化学研究所煤转化国家重点实验室,太原030001 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900 [3]中国科学院研究生院,北京100049
摘 要:
采用溶胶-凝胶法制备了TiO2纳米晶溶胶,并以旋涂法(spin-coating)镀制了高折射率光学薄膜。借助光散射技术和透射电镜研究了溶胶的微结构。采用原子力显微镜、场发射扫描电镜、紫外-可见-近红外光谱仪、椭偏仪、漫反射吸收光谱及强激光辐照实验,对膜层的结构、光学性能及抗激光损伤性能进行了系统的表征。结果显示:纳米晶薄膜的折射率达到了1.9,而传统的溶胶-凝胶薄膜折射率只有1.6;同时纳米晶薄膜的抗激光损伤阈值与传统的溶胶-凝胶薄膜相差不大,在1064nm处分别为16.3J/cm^2(3ns脉冲)和16.6J/cm^2(3ns脉冲);纳米晶溶胶薄膜可以在保持较高抗激光损伤阈值情况下,大幅度提高薄膜折射率。[著者文摘]
文章出处:
《强激光与粒子束》-2008年20卷1期 -75-78页
栏目信息:
文献标识码:
A
文章编号:
1001-4322(2008)01-0075-04
Preparation of high refractive index TiO2 thin film via sol-gel process
SHENG Yong-gang , XU Yao , ZHANG Lei , LIANG Li-ping , WU Dong, SUN Yu-han , JIANG Xiao-dong, WEI Xiao-feng (1. State Key Laboratory of Coal Conversion, Institute of Coal Chemistry, Chinese Academy of Sciences, Taiyuan 030001, China; 2. Research Center of Laser Fusion, CAEP, P. O. Box 919-987, Mianyang 621900, China;3. Graduate University of Chinese Academy of Sciences, Beijing 100049, China)
Abstract:
A simple sol-gel method was applied to prepare high refractive index thin film used in antilaser optical area, The method composed of two steps employing a complete hydrolysis and a restrained polycondensation at low temperature. The morphology of the resulting sol was determined by dynamic light scattering(DLS) techniques and was characterized as anatase by high-resolution transmission electron microscopy(HRTEM). The thin optical films were deposited on K9 glass by a sol-gel spin-coating method. The film shows the presence of nanocrystalline anatase phase by X-ray diffraction(XRD) analysis. The film surface examined by atomic force microscopy(AFM) shows a mean square roughness of 7.5 nm. The transmission spectra of the film were measured using a UV-Vis-NIR spectrometer, and the refractive index, absorption coefficient of the film were calculated by ellipsometer. The refractive index of the films was about 1.91, much larger than other sol-gel films (about 1.6). The average laser induced damage threshold is 16.3,J ·cm^-2 (3 ns pulse), close to that of amorphous sol-gel films ,(16.6 J · cm^-2 , 3 ns pulse) and much larger than that of physical films (10.8 J · cm^-2 , 3 ns pulse).[著者文摘]
Key words:
Sol-gel; TiO2 film; Refractive index; Laser induced damage threshold
基金资助:
国家自然科学基金重点资助课题(20133040)

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