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ACS Applied Electronic Materials

发文量 4,770

被引量 59,389

影响因子(2025版) 4.347

主办单位： AMER CHEMICAL SOC
出版地区： WASHINGTON
出版周期：月刊
别名： ACS APPL ELECTRON MA;ACS Appl. Electron. Mater.;ACS APPLIED ELECTRONIC MATERIALS

创刊时间： 2019年

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分析评价

vol.8 (2026)
vol.8 (2026)

1
vol.7 (2025)
vol.7 (2025)
vol.7 (2024)
vol.7 (2024)
vol.6 (2024)
vol.6 (2024)
vol.6 (2023)
vol.6 (2023)
vol.5 (2023)
vol.5 (2023)
vol.5 (2022)
vol.5 (2022)
vol.4 (2022)
vol.4 (2022)
vol.3 (2021)
vol.3 (2021)
vol.2 (2020)
vol.2 (2020)
vol.1 (2019)
vol.1 (2019)
vol. (2019)
vol. (2019)

封面

2026年1期

共：59篇

Londhe, PriyankaAthawale, AnjaliChaure, Nandu B.

6-47
Zhang, NathanKwon, Sun HwaDong, Lin

48-55
Krol, KonradTamulewicz-Szwajkowska, MagdalenaPiejko, AdriannaKopaczek, JanGelczuk, LukaszSerafinczuk, Jaroslaw

63-72
Yadav, SurajGill, Navkiranjot KaurMohapatra, Aiswarya AbhisekDehingia, AnuragGhosh, ArindamAvasthi, SushobhanChauhan, NehaPatil, Satish

73-80
Musah, Jamal-Deen Or, Siu Wing

81-91
Sahoo, Sovan Panja, Subhash Chandra Sarkar, Debashis Saha, Rituparna

92-110
Wang, XinchengYuan, YingxinXu, JinhaoLi, ZhenXu, TianyiLu, PenglinGuan, Shanshan

111-124
Jeyaseelan, AntonyJaved, N.Shastri, VijayendraParate, Shubham KumarPillai, GayathriNukala, PavanPratap, Rudra

125-133
Liu, YingLin, YufanCong, LiLiu, MeiyanYao, ChunxiaJia, YuxinCheng, XiaohuaChang, XueruiLv, LongyunLi, JuanYin, XiaodongCui, Bin-Bin

134-145
Xiao, Yaxuan Zhou, Mengni Zhu, Tao

146-154
Roseli, Ras BaizureenAllison, IleneShukla, AtulGale, InnesWhittaker, MiaWallwork, Nicholle R.Krenske, Elizabeth H.Namdas, Ebinazar B.Lo, Shih-Chun

155-165
Hu, YangLi, XiaoqinLiu, JianwenYu, YixiuLi, Yang

166-177
Tuerdi, Gulimire Zhang, Qinqiang Bao, Lei Zhang, Xiaoyan Suzuki, Ken Miura, Hideo Zhang, Zhengjun Fu, Wangyang

178-186
Li, Xiaogang Tang, Chuanguo Liao, Yanfei Li, Fengping Nie, Yunfeng Song, Sanzhao Bao, Guanjun

187-194
Ranjan, Alok Padovani, Andrea La Torraca, Paolo Pan, Jisheng Wang, Weijie Song, Wendong Bosman, Michel Pey, Kin Leong Raghavan, Nagarajan

195-204
Park, Chang-Shin Seo, Yeoung-Eun Luo, Fang Park, So Mang Chae, Ji-Yoon Kim, Han-Ki

216-227
Dar, Shazia Akhtar Gahlawat, Devansh Sengar, Brajendra Singh

228-248
Shimazoe, Kazuki Kato, Masashi Nishinaka, Hiroyuki

249-255
Han, Gi Hyeon

265-269
Chen, Yuanfen Li, Lin Tang, Wang Wang, Yong Luo, Xianrui You, Hui

282-292