Russian Microelectronics is a peer-reviewed journal devoted to technological, physical, and circuit engineering aspects of micro- and nanoelectronics. Special attention is paid to new trends in lithography (optical, X-ray, electron, ion), etching, doping, deposition, and planarization at the submicron and nanometer scales. The journal also encompasses an array of topics, including beam and plasma technologies, molecular beam epitaxy and dry etching; the methods of study and control of surfaces and multilayer structures; mathematical modeling and real-time diagnostics of technological processes; semiconductor devices based on new physical principles, such as quantum dimensional effects and superconductivity; heterostructures, nanotransistors, and semiconductor implementations of quantum bits (qubits). The journal publishes original manuscripts submitted in English, as well as works translated from several other journals. The sources of content are indicated at the article level. The peer review policy of the journal is independent of the manuscript source, ensuring a fair and unbiased evaluation process for all submissions. As part of its aim to become an international publication, the journal welcomes submissions in English from all countries.